715166
Octadecylphosphonic acid
97%
Synonym(s):
n-Octadecylphosphonic acid, ODPA
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About This Item
Empirical Formula (Hill Notation):
C18H39O3P
CAS Number:
Molecular Weight:
334.47
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352300
MDL number:
Product Name
Octadecylphosphonic acid, 97%
InChI
1S/C18H39O3P/c1-2-3-4-5-6-7-8-9-10-11-12-13-14-15-16-17-18-22(19,20)21/h2-18H2,1H3,(H2,19,20,21)
SMILES string
CCCCCCCCCCCCCCCCCCP(O)(O)=O
InChI key
FTMKAMVLFVRZQX-UHFFFAOYSA-N
assay
97%
form
crystals
mp
95-100 °C
Quality Level
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Application
Anti-corrosive coatings on cupronickel (CuNi) can be formed by fabricating a protective film of OPA by dip coating method. OPA may be used in the preparation of indium oxide(In2O3) nanowire transistor than can find potential application in the growth of fast switching and low noise nano-electronic devices. It may be used for self-cleaning and oil/water separation based applications as it forms a superhydrophobic layer on the copper mesh.
General description
Octadecylphosphonic acid (OPA) is used as a self-assembled monolayer that forms a surfactant which strongly bonds with the surface atoms of different metal oxides. It provides hydrophobic properties and covers a higher surface area than the predominantly used silanes.
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Warning
hcodes
Hazard Classifications
Eye Irrit. 2 - Skin Irrit. 2
Storage Class
11 - Combustible Solids
wgk
WGK 3
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Resistance of Superhydrophobic Surface-Functionalized TiO2 Nanotubes to Corrosion and Intense Cavitation.
Hua W.
Nanomaterials, 8(10), 783-783 (2018)
Fast formation of superhydrophobic octadecylphosphonic acid (ODPA) coating for self-cleaning and oil/water separation.
Dai C, et al.
Soft Matter, 10(40), 8116-8121 (2014)
n-Octadecylphosphonic acid grafted mesoporous magnetic nanoparticle: Preparation, characterization, and application in magnetic solid-phase extraction.
Ding J, et al.
Journal of Chromatography A, 1217(47), 7351-7358 (2010)
Fabrication of controllable and stable In2O3 nanowire transistors using an octadecylphosphonic acid self-assembled monolayer.
Lim T, et al.
Nanotechnology, 26(14), 145203-145203 (2015)
Getachew Tizazu et al.
Langmuir : the ACS journal of surfaces and colloids, 25(18), 10746-10753 (2009-07-18)
Electron-hole pair formation at titania surfaces leads to the formation of reactive species that degrade organic materials. Here, we describe the degradation of self-assembled monolayers of alkylphosphonic acids on the native oxide of titanium following exposure to UV light. The
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