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About This Item
Empirical Formula (Hill Notation):
HNO3
CAS Number:
Molecular Weight:
63.01
UNSPSC Code:
12352301
eCl@ss:
38060304
PubChem Substance ID:
NACRES:
NA.22
MDL number:
Assay:
≥99.999% trace metals basis, 70%
Form:
liquid
SMILES string
O[N+]([O-])=O
InChI
1S/HNO3/c2-1(3)4/h(H,2,3,4)
InChI key
GRYLNZFGIOXLOG-UHFFFAOYSA-N
vapor density
1 (vs air)
vapor pressure
8 mmHg ( 20 °C)
assay
≥99.999% trace metals basis, 70%
form
liquid
purified by
redistillation
color
colorless
pH
<1.0
bp
120.5 °C (lit.)
density
1.413 g/mL at 20 °C (lit.)
functional group
nitrate
Quality Level
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General description
Nitric acid is generally used as a primary reagent for the nitration of organic molecules. It is also used as a strong oxidizing agent in organic synthesis to perform the oxidative transformations.
Application
Nitric acid used as a reagent in:
- The nitration of aromatic compounds, aromatic heterocycles, alkenes, active methylene carbons, etc.
- Selective oxidation of organosulfur compounds to corresponding sulfoxides using a solid acid catalyst.
- The oxidation of alcohols, aldehydes, esters, and heteroatoms.
- The aromatization and dehydrogenation reactions.
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 3 Inhalation - Eye Dam. 1 - Met. Corr. 1 - Ox. Liq. 3 - Skin Corr. 1A
supp_hazards
Storage Class
5.1B - Oxidizing hazardous materials
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
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Chemoselective sulfoxidation by H2O2 or HNO3 using a phosphate impregnated titania catalyst
Bharadwaj SK, et al.
Tetrahedron Letters, 50(27), 3767-3771 (2009)
Trace metal contents of three tricalcium silicate materials: MTA Angelus, Micro Mega MTA and Bioaggregate
Kum KY,et al.
International Endodontic Journal, 47(7), 704-710 (2014)
Quantification of Sodium Accumulation in Arabidopsis thaliana Using Inductively Coupled Plasma Optical Emission Spectrometery (ICP-OES)
Choi WG and Gilroy S
Bio-protocol, 5(16) (2015)
Nitric acid in the presence of P2O5 supported on silica gel?a useful reagent for nitration of aromatic compounds under solvent-free conditions
Hajipour AR and Ruoho AE
Tetrahedron Letters, 46(48), 8307-8310 (2005)
Controlled nitration of anisole over HNO3/PO4/MoO3/SiO2/solvent systems
Adamiak J
J. Mol. Catal. A: Chem., 407, 81-86 (2015)
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