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Merck

401781

Bis(pentamethylcyclopentadienyl)cobalt(II)

Synonym(s):

CoCp*2, Decamethylcobaltocene

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About This Item

Empirical Formula (Hill Notation):
C20H30Co
CAS Number:
Molecular Weight:
329.39
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
MDL number:
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form

solid

Quality Segment

reaction suitability

core: cobalt

mp

>210 °C (lit.)

storage temp.

2-8°C

SMILES string

[Co].C[C]1[C](C)[C](C)[C](C)[C]1C.C[C]2[C](C)[C](C)[C](C)[C]2C

InChI

1S/2C10H15.Co/c2*1-6-7(2)9(4)10(5)8(6)3;/h2*1-5H3;

InChI key

XDHJNPINFJSJJB-UHFFFAOYSA-N

General description

Bis(pentamethylcyclopentadienyl)cobalt(II) is a powerful electron donor that is widely used as a dopant to prepare molecular semiconductors due to its low solid-state ionization energy (3.3 eV). The dopant improves charge injection and transport in electronic devices.

Application

Bis(pentamethylcyclopentadienyl)cobalt(II) can be used as:
  • An n-type dopant to fabricate organic electronic materials such as copper phthalocyanine thin films.
  • A reducing agent to synthesize high-quality reduced graphene oxide thin films at room temperature.
  • A metal organic precursor for plasma-enhanced atomic layer deposition of cobalt.


Storage Class

11 - Combustible Solids

wgk

WGK 3

flash_point_f

Not applicable

flash_point_c

Not applicable

ppe

Eyeshields, Gloves, type N95 (US)


Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

Class I Designated Chemical Substances

prtr

Substances Subject to be Indicated Names

ishl_indicated

Substances Subject to be Notified Names

ishl_notified

401781-1G:4.548173952512E12

jan



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View All Articles

Decamethylcobaltocene as an efficient n-dopant in organic electronic materials and devices
Calvin K. Chan, et al.
Organic Electronics, 9, 575-581 (2008)
Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor
Jusang Park, et al.
Journal of Energy Chemistry, 22, 403-407 (2013)
Reduction of Graphene Oxide Thin Films by Cobaltocene and Decamethylcobaltocene
Molly M. MacInnes, et al.
ACS Applied Materials & Interfaces, 10, 2004-2015 (2018)