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651761

Negative resist remover I

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About This Item

NACRES:
NA.23
UNSPSC Code:
12352300
Technical Service
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shelf life

1 yr (cool area away from direct sunlight)

Quality Level

100

pH

<2 (20 °C)

bp

204-304 °C (lit.)

density

1.00 g/mL at 25 °C (lit.)

storage temp.

2-8°C

General description

Available as part of Negative Photoresist kit 654892
Low pH formulation for removal of photoresist cured onto various substrates. Non-corrosive to metals and oxides. Does not contain chlorinated hydrocarbons, chromates, phenol, or phosphates. Performs well at room and elevated temperatures.

signalword

Danger

Hazard Classifications

Acute Tox. 4 Oral - Aquatic Chronic 2 - Asp. Tox. 1 - Carc. 2 - Eye Dam. 1 - Skin Corr. 1

Storage Class

8A - Combustible corrosive hazardous materials

wgk

WGK 3

flash_point_f

204.8 °F

flash_point_c

96 °C

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

Class I Designated Chemical Substances

prtr

Substances Subject to be Indicated Names

ishl_indicated

Substances Subject to be Notified Names

ishl_notified

651761-250ML:4548173913131 + 651761-BULK: + 651761-VAR:

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Certificates of Analysis (COA)

Lot/Batch Number
MKCR8695
MKCN0261
MKCM9918
MKCK5971
MKCK1587

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Protocols

ネガ型フォトレジストキットの取り扱い方法

本フォトレジストキットには、リソグラフィープロセスにおける各ステップで必要な材料が含まれています。各材料は、すぐにお使いいただけるようにあらかじめ計量されており、エッチング液については、様々な基板に適切なものをお選びいただけるように、個別に販売しています。

Negative Photoresist Procedure

Photoresist kit offers pre-weighed chemical components for lithographic processes, with separate etchants for various substrate choices.