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1.12310

Silicon standard solution

traceable to SRM from NIST acidic, (NH4)2SiF6 in H2O 1000 mg/l Si Certipur®

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About This Item

NACRES:
NA.24
UNSPSC Code:
41116107
Technical Service
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grade

analytical standard

Quality Segment

100

agency

suitable for EPA 200.7

product line

Certipur®

concentration

1000 mg/L Si in H2O

technique(s)

ICP: suitable

pH

3.4 (20 °C in H2O)

density

1.00 g/cm3 at 20 °C

application(s)

industrial qc
pharmaceutical

format

single component solution

storage temp.

15-25°C

General description

 Download your certificate at https://www.sigma-aldrich.com to view certified values, including uncertainty, date of expiry, and detailed information about trace impurities.

Application

Silicon standard solution can be used as a calibration standard for the determination of silicon in plants using inductively coupled plasma optical emission spectrometry (ICP OES).

Analysis Note

1000 mg/L Si in H2O, prepared with high-purity (NH4)2SiF6 and water.

Other Notes

For a complete product listing of our ICP and AAS range, including technical information and example certificates, please visit ICP & AAS standards website.

Detailed information on our complete workflow solutions for ICP-AAS can be found in our Brochure: High-Purity Chemicals for Inorganic Trace Analysis.

In our effort to be more sustainable, we′re going digital with COAs-download them directly from our website.

Legal Information

CERTIPUR is a registered trademark of Merck KGaA, Darmstadt, Germany

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Storage Class

12 - Non Combustible Liquids

wgk

WGK 2

Regulatory Listings

Regulatory Listings are mainly provided for chemical products. Only limited information can be provided here for non-chemical products. No entry means none of the components are listed. It is the user’s obligation to ensure the safe and legal use of the product.

16919-19-0

CAS No.

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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