316989
Hydrogen peroxide solution
contains potassium stannate as inhibitor, 30-32 wt. % in water, semiconductor grade, 99.999% trace metals basis
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About This Item
Empirical Formula (Hill Notation):
H2O2
CAS Number:
Molecular Weight:
34.01
PubChem Substance ID:
UNSPSC Code:
12352300
Beilstein/REAXYS Number:
3587191
MDL number:
Assay:
99.999% trace metals basis
Form:
liquid
vapor density
1 (vs air)
Quality Level
vapor pressure
23.3 mmHg ( 30 °C)
assay
99.999% trace metals basis
form
liquid
contains
potassium stannate as inhibitor, stabilizer
reaction suitability
reagent type: oxidant
concentration
30-32 wt. % in water, semiconductor grade
density
1.11 g/mL at 25 °C
storage temp.
2-8°C
SMILES string
OO
InChI
1S/H2O2/c1-2/h1-2H
InChI key
MHAJPDPJQMAIIY-UHFFFAOYSA-N
General description
Hydrogen peroxide solution is a widely used oxidizing agent in a variety of applications, including the oxidation of cyanide in industrial waste samples, the removal of ammonia from semiconductor wastewater, the removal of ibuprofen from water and wastewater, and the treatment of wastewater containing five-membered heterocyclic pyrazoles. It is one of the most widely used wet electronic chemicals.
Application
Hydrogen peroxide solution can be used in the substrate preparation for ultrathin polymer films.
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signalword
Danger
hcodes
Hazard Classifications
Aquatic Chronic 3 - Eye Dam. 1
Storage Class
5.1B - Oxidizing hazardous materials
wgk
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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Yang J, et al.
Age (Dordrecht, Netherlands), 35(1), 11-22 (2013)
Integrated countercurrent reverse osmosis cascades for hydrogen peroxide ultrapurification
Abejon R, et al.
Computers & Chemical Engineering, 41, 67-76 (2012)
Photochemical reduction of gold (III) on semiconductor dispersions of TiO2 in the presence of CN- ions: disposal of CN- by treatment with hydrogen peroxide
Serpone N, et al.
Journal of Photochemistry, 36, 373-388 (1987)