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Merck

06103

Hidróxido de potasio

technical, ≥85%, powder

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Fórmula lineal:
KOH
Número CAS:
Peso molecular:
56.11
UNSPSC Code:
12352106
eCl@ss:
38100303
PubChem Substance ID:
EC Number:
215-181-3
NACRES:
NA.21
MDL number:
Assay:
≥85%
Form:
powder
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vapor pressure

1 mmHg ( 719 °C)

Quality Level

grade

technical

assay

≥85%

form

powder

impurities

≤0.002% heavy metals (as Pb), ≤1.0% K2CO3

pH

~13.5 (25 °C, 5.6 g/L)

mp

361 °C (lit.)

anion traces

chloride (Cl-): ≤1000 mg/kg, sulfate (SO42-): ≤50 mg/kg

cation traces

Fe: ≤20 mg/kg

SMILES string

[OH-].[K+]

InChI

1S/K.H2O/h;1H2/q+1;/p-1

InChI key

KWYUFKZDYYNOTN-UHFFFAOYSA-M

General description

Potassium hydroxide is an inorganic compound with the chemical formula KOH. It is a strong base and is commonly known as caustic potash. Caustic potash is mainly used for making potassium salts, acid-base titrations, and organic synthesis. Furthermore, KOH can be used as an electrolyte in some fuel cells and alkaline batteries. Potassium hydroxide readily reacts with acids. It is used in various reactions such as nucleophilic, addition, and basic hydrolysis reactions. Additionally, it is employed as a catalyst for aldol-type reactions.

Application

Potassium hydroxide can be used:
  • To prepare KOH treated powder activated carbon, which is used as a catalyst for the synthesis of CNT (carbon nano tube) using chemical vapor deposition (CVD) method.
  • As a base in the intramolecular N-arylation of urea′s to form benzimidazol-2-ones.
  • As a catalyst for the synthesis of khellactone-type compounds (10-aryl substituted-9,10-dihydropyrano[2,3-h] benzopyrone-8-ones) via one-pot, three-component (Meldrum′s acid, aryl aldehydes and 5,7-dihydroxy benzopyrone derivatives) reaction.



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pictograms

CorrosionExclamation mark

signalword

Danger

Hazard Classifications

Acute Tox. 4 Oral - Eye Dam. 1 - Met. Corr. 1 - Skin Corr. 1A

Clase de almacenamiento

8A - Combustible corrosive hazardous materials

wgk

WGK 1

flash_point_f

Not applicable

flash_point_c

Not applicable



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Yuewang Huang et al.
Optics express, 23(5), 6780-6786 (2015-04-04)
We demonstrate a novel technique to fabricate sub-micron silicon nitride waveguides using conventional contact lithography with MEMS-grade photomasks. Potassium hydroxide anisotropic etching of silicon facilitates line reduction and roughness smoothing and is key to the technique. The fabricated waveguides is
Aldol condensation in gaseous phase by zeolite catalysts.
Wierzchowski PT and Zatorski LW.
Catalysis Letters, 9(5-6), 411-414 (1991)
Rokas Drevinskas et al.
Optics express, 23(2), 1428-1437 (2015-04-04)
Surface texturing is demonstrated by the combination of wet etching and ultrafast laser nanostructuring of silica glass. Using potassium hydroxide (KOH) at room temperature as an etchant of laser modified glass, we show the polarization dependent linear increase in retardance