257222
Trimethylaluminum
97%
Sinónimos:
Aluminum trimethanide, TMA
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Fórmula lineal:
(CH3)3Al
Número CAS:
Peso molecular:
72.09
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
EC Number:
200-853-0
Beilstein/REAXYS Number:
3587197
MDL number:
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Permítanos ayudarleNombre del producto
Trimethylaluminum, 97%
InChI key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
InChI
1S/3CH3.Al/h3*1H3;
SMILES string
C[Al](C)C
vapor pressure
69.3 mmHg ( 60 °C)
description
heat of vaporization: ~41.9 kJ/mol (dimer)
assay
97%
form
liquid
reaction suitability
core: aluminum
bp
125-126 °C (lit.)
127 °C/760 mmHg
20 °C/8 mmHg
56 °C/50 mmHg
mp
15 °C (lit.)
density
0.752 g/mL at 25 °C (lit.)
Quality Level
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Application
Trimethylaluminum can be used:
- As a growth initiator to synthesize self-assembled aluminum nanoparticles via atomic layer deposition.
- As a precursor to synthesize aluminum-doped ZnO thin films(AZO) for electron transport layer of perovskite solar cells. TMA enhances electrical conductivity and thermal stability of perovskite layers.
- To fabricate Al2O3-coated Si-alloy anodes for Li-ion batteries. This coating helps to suppress the volume expansion of Si and improves cell stability.
- To fabricate Al2O3-coated graphite electrode with superior anti-self-discharging behavior (260 h) with long stability (900 cycles), for Al-ion battery.
General description
Trimethylaluminum (TMA) is a widely used precursor in the chemical vapor deposition (CVD) process to produce thin films in various applications. TMA is highly reactive and pyrophoric, which makes it an effective source of aluminum in thin film deposition processes to improve optoelectronic properties, such as enhanced light absorption and carrier transport characteristics.
Other Notes
Storage below 20°C may cause crystallization.
Packaging
Supplied in a Sure/Pac™ cylinder with a 1/4-turn bronze ball valve (Z122661) installed. This has a female 1/4"" NPT outlet thread and is closed with a male 1/4"" NPT carbon steel plug. The plug must be removed before use after ensuring the valve is in the closed position.
Compatible with the following:
Compatible with the following:
- Aldrich® Sure/Pac™ station for liquefied gases Z566446
- PTFE Sealing tape Z104388 or Z221880
- Straight septum-inlet adapter Z118141 with septa Z565687 or Z565695
Legal Information
Aldrich is a registered trademark of Sigma-Aldrich Co. LLC
Sure/Pac is a trademark of Sigma-Aldrich Co. LLC
signalword
Danger
hcodes
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react 1
supp_hazards
Clase de almacenamiento
4.2 - Pyrophoric and self-heating hazardous materials
wgk
nwg
flash_point_f
No data available
flash_point_c
No data available
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
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Metalorganic chemical vapor deposition of Al2O3 using trimethylaluminum and O2 precursors: Growth mechanism and crystallinity
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Journal of Crystal Growth, 408, 78-84 (2014)
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Oili ME, et al.
Thin Solid Films, 552, 124-135 (2014)
Photo-induced current and its degradation in Al4C3/Al2O3 (0001) grown by metalorganic chemical vapor deposition
Kim D, et al.
Thin Solid Films, 557, 216-221 (2014)
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Defining mechanisms that generate intratumour heterogeneity and branched evolution may inspire novel therapeutic approaches to limit tumour diversity and adaptation. SETD2 (Su(var), Enhancer of zeste, Trithorax-domain containing 2) trimethylates histone-3 lysine-36 (H3K36me3) at sites of active transcription and is mutated
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