Accéder au contenu
Merck

168521

Luperox® DI, tert-Butyl peroxide

98%

Synonyme(s) :

tert-Butyl peroxide, Di-tert-butyl peroxide

Se connecter pour consulter les tarifs organisationnels et contractuels.

Sélectionner une taille de conditionnement


A propos de cet article

Formule linéaire :
(CH3)3COOC(CH3)3
Numéro CAS:
Poids moléculaire :
146.23
UNSPSC Code:
12352120
NACRES:
NA.22
PubChem Substance ID:
EC Number:
203-733-6
Beilstein/REAXYS Number:
1735581
MDL number:
Assay:
98%
Form:
liquid
Service technique
Besoin d'aide ? Notre équipe de scientifiques expérimentés est là pour vous.
Laissez-nous vous aider
Service technique
Besoin d'aide ? Notre équipe de scientifiques expérimentés est là pour vous.
Laissez-nous vous aider

InChI key

LSXWFXONGKSEMY-UHFFFAOYSA-N

InChI

1S/C8H18O2/c1-7(2,3)9-10-8(4,5)6/h1-6H3

SMILES string

CC(C)(C)OOC(C)(C)C

vapor pressure

40 mmHg ( 20 °C)

assay

98%

form

liquid

reaction suitability

reagent type: oxidant

refractive index

n20/D 1.3891 (lit.)

bp

109-110 °C (lit.)

density

0.796 g/mL at 25 °C (lit.)

functional group

peroxide

storage temp.

2-8°C

Quality Level

Catégories apparentées

Application

Luperox®DI, tert-Butyl peroxide has been used as a radical initiator to induce free radical polymerization. It has also been used as a cetane enhancer in a study to determine the phase behavior of carboxylate-based extended surfactant reverse micellar microemulsions with ethanol and vegetable oil/diesel blends.

Legal Information

Product of Arkema Inc.
Luperox is a registered trademark of Arkema Inc.

pictograms

FlameHealth hazard

signalword

Danger

Hazard Classifications

Aquatic Chronic 3 - Flam. Liq. 2 - Muta. 2 - Org. Perox. E

Classe de stockage

5.2 - Organic peroxides and self-reacting hazardous materials

wgk

WGK 1

flash_point_f

42.8 °F - closed cup

flash_point_c

6 °C - closed cup

ppe

Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter


Faites votre choix parmi les versions les plus récentes :

Certificats d'analyse (COA)

Lot/Batch Number

Vous ne trouvez pas la bonne version ?

Si vous avez besoin d'une version particulière, vous pouvez rechercher un certificat spécifique par le numéro de lot.

Déjà en possession de ce produit ?

Retrouvez la documentation relative aux produits que vous avez récemment achetés dans la Bibliothèque de documents.

Consulter la Bibliothèque de documents

B H Shen et al.
Science advances, 5(7), eaaw4856-eaaw4856 (2019-07-25)
Electrochemical reduction of lithium ion battery electrolyte on Si anodes was mitigated by synthesizing nanoscale, conformal polymer films as artificial solid electrolyte interface (SEI) layers. Initiated chemical vapor deposition (iCVD) was used to deposit poly(1,3,5,7-tetravinyl-1,3,5,7-tetramethylcyclotetrasiloxane) (pV4D4) onto silicon thin film
Hironori Kitaguchi et al.
Journal of the American Chemical Society, 127(18), 6605-6609 (2005-05-05)
Well-resolved ESR spectra of free pentadienyl radicals have been observed under photoirradiation of di-tert-butylperoxide (Bu(t)OOBu(t)) and polyunsaturated fatty acids in the absence of O(2), allowing us to determine the hfc values. The hfc values of linoleyl radical indicate that the
Carson T Riche et al.
Nature communications, 7, 10780-10780 (2016-02-24)
The translation of batch chemistries onto continuous flow platforms requires addressing the issues of consistent fluidic behaviour, channel fouling and high-throughput processing. Droplet microfluidic technologies reduce channel fouling and provide an improved level of control over heat and mass transfer
A Mortensen et al.
FEBS letters, 426(3), 392-396 (1998-05-26)
Peroxyl radicals, as model for peroxyl radicals formed during autoxidation of lipids, have been generated in three solvent systems (cyclohexane, tetrahydrofuran and tert-butanol/water) by steady-state and laser flash photolysis, and their reaction with beta-carotene studied. Steady-state photolysis experiments showed that
Geun-Tae Yun et al.
Science advances, 4(8), eaat4978-eaat4978 (2018-08-29)
Both high static repellency and pressure resistance are critical to achieving a high-performance omniphobic surface. The cuticles of springtails have both of these features, which result from their hierarchical structure composed of primary doubly reentrant nanostructures on secondary microgrooves. Despite

Notre équipe de scientifiques dispose d'une expérience dans tous les secteurs de la recherche, notamment en sciences de la vie, science des matériaux, synthèse chimique, chromatographie, analyse et dans de nombreux autres domaines..

Contacter notre Service technique