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About This Item
Linear Formula:
[CH2C(CH3)(CO2Na)]n
CAS Number:
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12162002
MDL number:
Product Name
Poly(methacrylic acid, sodium salt) solution, average Mw 4,000-6,000, 40 wt. % in H2O
InChI key
SONHXMAHPHADTF-UHFFFAOYSA-M
SMILES string
CC(=C)C(=O)O[Na]
InChI
1S/C4H6O2.Na/c1-3(2)4(5)6;/h1H2,2H3,(H,5,6);/q;+1/p-1
mol wt
average Mw 4,000-6,000
concentration
40 wt. % in H2O
refractive index
n20/D 1.430
density
1.251 g/mL at 25 °C
Quality Level
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Related Categories
Storage Class
12 - Non Combustible Liquids
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
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Stefaan J Soenen et al.
ACS nano, 6(7), 5767-5783 (2012-06-05)
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The Analyst, 137(19), 4469-4474 (2012-08-08)
An inverse opal photonic crystal sensor that could specifically detect chloramphenicol (CAP) in a label-free way was introduced in the current research. A colloidal crystal template was first prepared from monodisperse SiO(2) nanospheres. Precursors with different compositions were infused into
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This work focused on the design of new pH-responsive nanoparticles for controlled delivery of anticancer drug doxorubicin (Dox). Nanoparticles of poly(methacrylic acid)-polysorbate 80-grafted starch (PMAA-PS 80-g-St) were synthesized by using a one-pot method that enabled simultaneous grafting of PMAA and
Cemil Aydoğan et al.
Journal of separation science, 35(8), 1010-1016 (2012-05-17)
Polymethacrylate-based monolith with weak cation exchange functionalities was prepared in capillary column (i.d. 100 μm, o.d. 375 μm) by in situ polymerization of butyl methacrylate, ethylene dimethacrylate and N-methacryloyl-L-glutamic acid in presence of porogens. The porogen mixture included N,N-dimethyl formamide
Toshiyuki Kida et al.
Langmuir : the ACS journal of surfaces and colloids, 28(43), 15378-15384 (2012-10-02)
Isotactic poly(methyl methacrylate) (it-PMMA)/syndiotactic poly(methacrylic acid) (st-PMAA) stereocomplex hollow capsules were fabricated by the deposition of stereocomplex films of it-PMMA and st-PMAA on silica particles by alternate layer-by-layer assembly and the subsequent removal of the silica particles with aqueous HF.
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