663301
Trimethylaluminum
packaged for use in deposition systems
동의어(들):
Aluminum trimethanide, TMA
크기 선택
제품정보 (DICE 배송 시 비용 별도)
vapor pressure
69.3 mmHg ( 60 °C)
Quality Level
description
heat of vaporization: ~41.9 kJ/mol (Dimer)
form
liquid
reaction suitability
core: aluminum
bp
125-126 °C (lit.), 127 °C/760 mmHg, 20 °C/8 mmHg, 56 °C/50 mmHg
mp
15 °C (lit.)
density
0.752 g/mL at 25 °C (lit.)
SMILES string
C[Al](C)C
InChI
1S/3CH3.Al/h3*1H3;
InChI key
JLTRXTDYQLMHGR-UHFFFAOYSA-N
General description
Application
- A chemical vapor deposition precursor to fabricate PbSe quantum dot solids for optoelectronic devices.
- An aluminum precursor for the flame synthesis of alumina nanofibers.
- A reagent for efficient synthesis of allenes.
signalword
Danger
hcodes
supp_hazards
저장 등급
4.2 - Pyrophoric and self-heating hazardous materials
wgk
nwg
flash_point_f
No data available
flash_point_c
No data available
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Hazard Classifications
Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react. 1
문서
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.
Nanocomposite Coatings with Tunable Properties Prepared by Atomic Layer Deposition