331635
Tetramethylammonium hydroxide solution
25 wt. % in H₂O, solution
동의어(들):
TMAH solution
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크기 선택
제품정보 (DICE 배송 시 비용 별도)
Linear Formula:
(CH3)4N(OH)
CAS 번호:
Molecular Weight:
91.15
NACRES:
NA.21
PubChem Substance ID:
UNSPSC Code:
12352100
MDL number:
Beilstein/REAXYS Number:
3558708
Concentration:
25 wt. % in H2O
Form:
liquid
제품 이름
Tetramethylammonium hydroxide solution, 25 wt. % in H2O
InChI
1S/C4H12N.H2O/c1-5(2,3)4;/h1-4H3;1H2/q+1;/p-1
SMILES string
[OH-].C[N+](C)(C)C
InChI key
WGTYBPLFGIVFAS-UHFFFAOYSA-M
vapor pressure
17.5 mmHg ( 20 °C)
form
liquid
concentration
25 wt. % in H2O
refractive index
n20/D 1.3806
Quality Level
pH
>13 (20 °C)
solubility
water: soluble
density
1.016 g/mL at 25 °C
functional group
amine
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General description
Tetramethylammonium hydroxide solution is commonly used as a strong base and nucleophilic source in organic synthesis reactions.
Application
Tetramethylammonium hydroxide is a quaternary ammonium salt generally used as an anisotropic etchant for silicon due to its high silicon etching rate.
Tetramethylammonium hydroxide solution (25 wt.% solution in water) may be used as a base for pH adjustment to obtain hexagonal mesoporous aluminophosphate (TAP).
signalword
Danger
Hazard Classifications
Acute Tox. 1 Dermal - Acute Tox. 2 Oral - Aquatic Chronic 2 - Eye Dam. 1 - Skin Corr. 1B - STOT RE 1 Dermal - STOT SE 1
target_organs
Central nervous system, Liver,thymus
저장 등급
6.1B - Non-combustible acute toxic Cat. 1 and 2 / very toxic hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Palladium-mediated carboxylation of aryl halides (triflates) or benzyl halides using [13 C]/[11 C] carbon monoxide with tetrabutylammonium hydroxide or trimethylphenylammonium hydroxide
Karimi F, et al.
Journal of the Chemical Society. Perkin Transactions 1, 20, 2256-2259 (2002)
Tetramethylammonium Hydroxide
Knight J
eEROS (Encyclopedia of Reagents for Organic Synthesis) (2001)
Study on anisotropic silicon etching characteristics in various surfactant-added tetramethyl ammonium hydroxide water solutions.
Yang CR, et al.
Journal of Micromechanics and Microengineering, 15(11), 2028-2028 (2005)
The characteristic behavior of TMAH water solution for anisotropic etching on both silicon substrate and SiO 2 layer.
Chen PH, et al.
Sensors and actuators A, Physical, 93(2), 132-137 (2001)
Synthesis of mesoporous hexagonal titanium aluminophosphate molecular sieves and their catalytic applications
Kapoor MP & Raj A.
Applied Catalysis A: General, 203(2), 311-319 (2000)
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