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크기 선택
제품정보 (DICE 배송 시 비용 별도)
Linear Formula:
(CH3)4N(OH)
CAS 번호:
Molecular Weight:
91.15
NACRES:
NA.21
PubChem Substance ID:
UNSPSC Code:
12352100
MDL number:
Beilstein/REAXYS Number:
3558708
Concentration:
25 wt. % in methanol
Form:
liquid
제품 이름
Tetramethylammonium hydroxide solution, 25 wt. % in methanol
InChI
1S/C4H12N.H2O/c1-5(2,3)4;/h1-4H3;1H2/q+1;/p-1
SMILES string
[OH-].C[N+](C)(C)C
InChI key
WGTYBPLFGIVFAS-UHFFFAOYSA-M
vapor pressure
17.5 mmHg ( 20 °C)
form
liquid
concentration
25 wt. % in methanol
impurities
≤10% water, ≤2% chloride
density
0.866 g/mL at 25 °C
functional group
amine
Quality Level
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General description
Tetramethylammonium hydroxide is a strong base used in the o-alkylation of phenolic and carboxylic OH groups.
Tetramethylammonium hydroxide is a quaternary ammonium salt generally used as an anisotropic etchant for silicon due to its high silicon etching rate.
Tetramethylammonium hydroxide is a quaternary ammonium salt generally used as an anisotropic etchant for silicon due to its high silicon etching rate.
Application
Tetramethylammonium hydroxide solution (25 wt.% solution in methanol) may be used in the synthesis of zirconium oxides via a modified sol-gel method with potential application as catalyst materials in CO hydrogenation.
signalword
Danger
Hazard Classifications
Acute Tox. 2 Dermal - Acute Tox. 2 Oral - Acute Tox. 3 Inhalation - Aquatic Chronic 3 - Eye Dam. 1 - Flam. Liq. 3 - Skin Corr. 1B - STOT RE 1 Dermal - STOT SE 1
target_organs
Eyes,Central nervous system, Liver,thymus
저장 등급
3 - Flammable liquids
wgk
WGK 3
flash_point_f
80.6 °F - closed cup
flash_point_c
27 °C - closed cup
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Amy J Williams et al.
Astrobiology, 19(4), 522-546 (2019-03-15)
The Mars Curiosity rover carries a diverse instrument payload to characterize habitable environments in the sedimentary layers of Aeolis Mons. One of these instruments is Sample Analysis at Mars (SAM), which contains a mass spectrometer that is capable of detecting
Characterization of Zirconia-based catalysts prepared by precipitation, calcination, and modified sol-gel methods.
Feng Z, et al.
Industrial & Engineering Chemistry Research, 34(1), 78-82 (1995)
Study on anisotropic silicon etching characteristics in various surfactant-added tetramethyl ammonium hydroxide water solutions.
Yang CR, et al.
Journal of Micromechanics and Microengineering, 15(11), 2028-2028 (2005)
The characteristic behavior of TMAH water solution for anisotropic etching on both silicon substrate and SiO 2 layer.
Chen PH, et al.
Sensors and actuators A, Physical, 93(2), 132-137 (2001)
Quantitative Methylation of Lignin Monomers Using Tetrabutylammonium Hydroxide and MeI and Applications in Organic Synthesis
Zuo Y, et al.
ACS Omega, 8, 7057-7062 (2023)
관련 콘텐츠
Instructions
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