773972
Yttrium sputtering target
diam. × thickness 2.00 in. × 0.25 in., 99.9% trace metals basis
Sinónimos:
Yttrium
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Acerca de este artículo
Fórmula empírica (notación de Hill):
Y
Número CAS:
Peso molecular:
88.91
NACRES:
NA.23
PubChem Substance ID:
UNSPSC Code:
12352103
EC Number:
231-174-8
MDL number:
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Permítanos ayudarleInChI key
VWQVUPCCIRVNHF-UHFFFAOYSA-N
InChI
1S/Y
SMILES string
[Y]
assay
99.9% trace metals basis
form
solid
reaction suitability
core: yttrium
resistivity
57 μΩ-cm, 20°C
diam. × thickness
2.00 in. × 0.25 in.
bp
3338 °C (lit.)
mp
1522 °C (lit.)
density
4.469 g/mL at 25 °C (lit.)
Quality Level
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Application
Solid Oxide Fuel cells operating at temperatures below 800 C (also known as intermediate temperature solid oxide fuel cell, IT-SOFC) are currently the topic of much research and development owing to the high degradation rates and materials costs incurred for SOFC operating at temperatures above 900 C. Thin films of electrode and electrolyte layers is one of the ways to achieve high performances in IT-SOFC.
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.
Yttrium sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing thin films also find applications as thermal barrier and protective coatings, example in thermoelectric devices.
Clase de almacenamiento
11 - Combustible Solids
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
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