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この商品について
化学式:
Ta(OC2H5)5
CAS番号:
分子量:
406.25
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
MDL number:
Beilstein/REAXYS Number:
3678999
InChI
1S/5C2H5O.Ta/c5*1-2-3;/h5*2H2,1H3;/q5*-1;+5
SMILES string
CCO[Ta](OCC)(OCC)(OCC)OCC
InChI key
HSXKFDGTKKAEHL-UHFFFAOYSA-N
assay
99.98% trace metals basis
form
liquid
reaction suitability
core: tantalum, reagent type: catalyst
impurities
<2 wt. % toluene
Quality Level
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関連するカテゴリー
General description
Tantalum(V) ethoxide is primarily used to produce tantalum oxide thin films for applications in optics, semiconductors, and electrochromic devices. These films possess high refractive index and excellent electrical insulation properties. Additionally, when tantalum is alloyed with other metals, it gains enhanced strength, ductility, and corrosion resistance, making it highly suitable for applications in electronics and advanced materials. Our 99.98% trace metals basis of Tantalum(V) ethoxide is suitable for the synthesis of tantalum oxide by chemical vapor deposition (CVD).
Application
Tantalum ethoxide is used as a precursor
- To synthesize modified tantalum-alkoxo complexes, enabling the fabrication of Ta₂O₅ thin films with tunable optical properties.
- In the sol–gel synthesis of tantalum oxide nanoparticles, which, when doped with rare earth elements, form wide band gap semiconductors showing both stokes and anti-stokes visible luminescence.
- To synthesize hollow TaOx nanoshells in the formation of Bi₂S₃@TaOx-HA core–shell nanoparticles, which serve as multifunctional theranostic agents for CT/photoacoustic imaging and enhanced photothermal cancer therapy.
Features and Benefits
- 99.98% purity on a trace metals basis ensures minimal contamination for critical applications, resulting in superior quality materials.
- Low metal impurities (< 250.0 ppm) enhance sol-gel formation for the synthesis of nanoparticles.
signalword
Warning
hcodes
Hazard Classifications
Flam. Liq. 3
保管分類
3 - Flammable liquids
wgk
WGK 1
flash_point_f
84.2 °F - closed cup
flash_point_c
29 °C - closed cup
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
適用法令
試験研究用途を考慮した関連法令を主に挙げております。化学物質以外については、一部の情報のみ提供しています。 製品を安全かつ合法的に使用することは、使用者の義務です。最新情報により修正される場合があります。WEBの反映には時間を要することがあるため、適宜SDSをご参照ください。
第4類:引火性液体 + 第二石油類 + 危険等級III + 非水溶性液体
fsl
339113-10G: + 339113-100G: + 339113-BULK: + 339113-VAR: + 339113-1G:
jan
Leakage currents in amorphous Ta 2 O 5 thin films
Chiu F, et al.
Journal of Applied Physics, 81(10), 6911-6915 (1997)
The Electrosynthesis of Tantalum Ethoxide
Yang H, et al.
Electrochemistry, 82(9), 743-748 (2014)
Controlling the synthesis of TaC nanopowders by injecting liquid precursor into RF induction plasma
Ishigaki T, et al.
Science and Technology of Advanced Materials, 6(2), 111-111 (2005)
Ultrathin tantalum oxide capacitor dielectric layers fabricated using rapid thermal nitridation prior to low pressure chemical vapor deposition
Kamiyama S, et al.
Journal of the Electrochemical Society, 140(6), 1617-1625 (1993)
Kuo-Shyan Lin et al.
Cancer research, 75(2), 387-393 (2014-12-10)
The bradykinin receptor B1R is overexpressed in many human cancers where it might be used as a general target for cancer imaging. In this study, we evaluated the feasibility of using radiolabeled kallidin derivatives to visualize B1R expression in a
資料
The properties of many devices are limited by the intrinsic properties of the materials that compose them.
ナノワイヤは、ナノスケールの電子的および構造的制御によってバルク材料の限界を克服し、次世代デバイスや応用の実現に貢献することが期待されています。
ライフサイエンス、有機合成、材料科学、クロマトグラフィー、分析など、あらゆる分野の研究に経験のあるメンバーがおります。.
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